Molecular Imprints nanoimprint technology brings together a series of unique core competencies including lithography, precision nanomechanics, fluid dynamics, surface chemistry and materials formulation. This approach has produced a broad intellectual property portfolio which includes over 700 global patent filings and over 100 issued patents. As masks and templates play a critical role in our technology, we have worked extremely closely with leading photomask makers to help insure the availability of leading edge photomasks and templates and also insure technical compatibility with our Jet and Flash™ Imprint Lithography (J-FIL™) process.
J-FIL technology, powered by our IntelliJet™ Drop Pattern Generator, is found on all Molecular Imprints systems and leverages the synergy of our materials and masks/templates to maximize system productivity and yield. Systems are in two classes: step and repeat for semiconductors and applications requiring tight overlay (e.g. Imprio 300) and systems which print an entire substrate at one time (e.g. Imprio HD2200) for applications like patterned media and high brightness LEDs.
