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Defect Reduction for Semiconductor Memory Applications Using Jet and Flash Imprint Lithography Zhengmao Ye, Kang Luo, Xiaoming Lu, Brian Fletcher, Weijun Liu, Frank Xu, Dwayne LaBrake, Douglas Resnick, S.V. Sreenivasan, SPIE Advanced Lithography, February 2013 |
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High Performance Wire Grid Polarizers using Roll Based Jet and Flash Imprint Lithography Sean Ahn, Jack Yang, Maha Ganapathisubramanian, Mike Miller, Jin Choi, Frank Xu, Douglas J. Resnick, S.V. Sreenivasan, SPIE Advanced Lithography, February 2013 |
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NIL Template: progress and challenges Naoya Hayashi, Dai Nippon Printing Co., SPIE Advanced Lithography, February 2013 |
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