The precision of the IntelliJet™ Drop Pattern Generator dispense technique compensates for variations in pattern density across templates, thereby maintaining a highly uniform residual layer across the entire substrate. IntelliJet Drop Pattern Generator builds a drop pattern by computing template pattern variations and then creating a spatial map of comparable resist volume variations. IntelliJet Drop Pattern Generator uses this volume map to compute a drop pattern so that the final imprints result in a highly uniform and consistent residual layer (typically ~15nm) across the entire patterned substrate, including, for example, discrete data tracks or bits, and microscopic patterns such as servo regions. Consistent residual layers thickness is critical to insuring uniform etch, which, in turn, results in uniform critical dimensions (CD) across the substrate. Uniform CDs typically translates into higher yields and better device performance.
Because imprint resist is dispensed with picoliter-level precision to match local template pattern volumes, there is virtually no waste of resist. IntelliJet Drop Pattern Generator achieves very high efficiency of material usage: whereas a spin-coating process requires approximately 0.5 mL of resist to coat both sides of a single disk, the same volume of imprint resist is sufficient for patterning approximately 5000 disks.
Molecular Imprints' Core Technology
Jet and Flash™ Imprint Lithography (J-FIL™) uses low viscosity UV imprints fluids...
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