Robust and high performance release materials that facilitate clean separation at the cured resist/mask interface are critical components of our materials family. A significant research effort determined that the widely adopted release approach of covalently bonding a fluorinated self assembled monolayer (SAM) material onto template surface was not itself a long term, cost effective solution. An in-situ self repair mechanism for the release layer during imprinting process can overcome the shortcomings, and is central to this technology.
