Jet and Flash™ Imprint Lithography (J-FIL™) encompasses a number of significant innovations, not the least of which was the development of a family of elegantly formulated and customized materials. These include the UV curable imprint resist that is ink-jetted onto the substrate, called MonoMat™, a release material coated on the mask, called RelMat™, and an adhesion layer for the substrate to promote adhesion of the cured MonoMat™. We offer two versions of adhesion promoters: TranSpin™ which is deposited using a spin coating process and ValMat™ which is deposited using a vapor prime approach.
Molecular Imprints' Core Technology
Jet and Flash™ Imprint Lithography (J-FIL™) uses low viscosity UV imprints fluids...
Molecular Imprints in the News
MII launches Semiconductor Industry into the 450mm era with the Imprio 450 lithography system