Pattern Driven Resist Placement Yields Consistent Etch Results
The IntelliJet Drop Pattern Generator provides highly optimized drop patterns to maximize residual layer thickness uniformity and optimize the imprint process for the Nutera HD7000, Perfecta TR1100, Imprio HD2200, Imprio 1100 and Imprio 300 systems.
IntelliJet Drop Pattern Generator combines a multiprocessor server with Molecular Imprints proprietary software in a patent-pending process to generate drop patterns of resist that conform to imprint template features. Using this combination along with the proper metrology allows for generation of highly optimized drop patterns in a reasonable timeframe. Drop pattern optimization provides improved residual layer thickness uniformity and ensures proper fluid filling into the template during imprint. A thin (<15nm) and consistent residual layer film, results in more precision, which in turn results in better CD uniformity, and ultimately better device performance and yields.
Click here to learn more about IntelliJet Drop Pattern Generator.
