Imprint materials that are used to form the pattern on the substrate using Jet and Flash™ Imprint Lithography (J-FIL™) can be one of two kinds: (i) a sacrificial imprint resist such as MonoMat or, (ii) a functional imprint material where the imprinted material directly becomes part of a device. Functional materials are more challenging to formulate as they have to satisfy both the imprint process constraints for achieving a high fidelity nano-pattern, and satisfy the properties required by the device over the course of its life. Molecular Imprints has worked with customers in two such emerging markets: directly patterned biomaterials and low-k dielectric materials.
