Applications and Process Support

Molecular Imprints is pioneering an innovative technology and simultaneously developing new markets for nanopatterning, which requires allocation of significant resources to customer application support. This includes not only a fully equipped Applications Laboratory in Austin, but also hiring and training skilled and experienced field application engineers in all major customer support markets. Application engineers are trained in the fundamentals of Jet and Flash™ Imprint Lithography (J-FIL™) , Molecular Imprints' material suite, as well as both the semiconductor step-and-repeat tools, and the large field printing tools for the HDD, LED, and other emerging market applications.

Applications Laboratory

Our Applications Laboratory is equipped with a complete suite of tools, including

  • Imprio 300 for semiconductor device development
  • Imprio HD2200 for HDD patterned media
  • Perfecta TR1100 for template replication
  • Imprio 1100 for high brightness LED and emerging applications

Tools are complemented by appropriate substrate cleaning and adhesion-promoting capabilities as follows:

Automated wafer and disk cleaners

  • All hard disk media sizes
  • 2 ” through 4” wafers
  • 6 ” and 8” wafers handled in SMIF

Spin coating of adhesion layers

  • 2 ” through 4” wafers
  • 6 ” and 8” wafers handled in SMIF

Vapor coating of adhesion layer on disks

  • All disk sizes in 25 disk batches

Pattern transfer capabilities

  • 3 chamber plasma etch tool
  • Silicon oxide and nitride, Cr, Ta and resist etching
  • Hard mask etching and template and mask replication

Metrology capabilities

  • Thin film reflectometery
  • Defect review SEM
  • Field emission SEM
  • KLA 2132 defect inspection
  • Candela 6120 and CS20 for wafers and disk inspection

 

 

 

Molecular Imprints' Core Technology

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Jet and Flash™ Imprint Lithography (J-FIL™) uses low viscosity UV imprints fluids...

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Molecular Imprints in the News

MII launches Semiconductor Industry into the 450mm era with the Imprio 450 lithography system

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