Precision Nanoimprint Lithography System for Template Replication
The Perfecta TR1100 system for nanoimprint template replication, based on the Jet and Flash™ Imprint Lithography (J-FIL™) technology, enables cost-effective replicating of sub-50nm featured templates. The system platform is based on three previous generations of Imprio tools and is specifically designed to produce templates meeting the requirements for use with the Imprio 1100 and Imprio HD2200 imprint lithography systems. The TR1100 produces an identical copy of a master template, which then can be used for low cost imprinting. The TR1100 system capabilities include alignment, template automation, ability to handle 150mm synthetic quartz substrates and process compatibility with semiconductor manufacturing flows. The system can produce approximately ten (10) templates per hour, more than two orders of magnitude more productive than today’s leading edge template writers.
The TR1100 system ensures the lowest possible CoO by utilizing the cost effective J-FIL technology to provide low cost replicates of costly master templates.
Resolution: Sub-50nm
Alignment: <10um (template to substrate)
Flexibility: Designed for 150mm synthetic quartz substrates
Automation: Automated wafer and template loading
To download the Perfecta TR1100 Data Sheet, click here.
To request more information on Perfecta TR1100, click here.
