High Resolution, Low Cost CMOS Nanoimprint Lithography System
The Imprio 300 system represents the next generation in nanoimprint lithography and is designed with demanding CMOS applications in mind. The Imprio 300 system represents the industry's highest resolution and lowest cost-of-ownership nanoimprint lithography solution for IC prototyping and process development at the 32nm node and beyond.
The Imprio 300 uses Molecular Imprints Jet and Flash™ Imprint Lithography (J-FIL™) nanoimprint technology, including IntelliJet™ Drop Pattern Generator, to place low-viscosity resist only where needed on the substrate. Molecular Imprints technology is superior to spin-on imprint techniques that waste consumables and require the purchase of costly and space-consuming track. The Imprio 300 uses optical masks, resists, and sources to achieve sub-32nm half-pitch resolution, sub-10nm alignment, integrated magnification control, and fully automated wafer and mask loading. Imprio 300 is ideal for process development, advanced device prototyping and cell library development at the 32nm node, 22nm node and beyond.
The Imprio 300 offers sub-32nm half pitch resolution, sub-10nm alignment, integrated magnification control, and fully automated wafer and template loading capability.
Resolution: Sub-32nm half pitch
Alignment: < 10nm, 3σ (single point, X,Y)
Automation: Fully automated wafer and mask loading
Flexibility: 200mm and 300mm substrates (SEMI standard)
Field size: 26mm x 32mm (step-and-scan compatible)
Throughput: Four wafers per hour
The Imprio 300 is ideal for device and process prototyping for 32nm resolution, 22nm resolution, and beyond.
The Imprio 300 is the industry’s lowest cost of ownership lithography solution. Click here to find out why.
Click here to view or download the Imprio 300 Data Sheet.
Click here to request more information on the Imprio 300.
