Industry-first Nanoimprint Lithography Solution for Semiconductor 6025
Mask Replication
Perfecta MR5000 nanoimprint mask replication system is designed to faithfully and cost-effectively reproduce leading-edge resolution original master masks for the manufacture of critical semiconductor memory device layers. The MR5000 system is based on Molecular Imprints’ proprietary Jet and Flash™ Imprint Lithography (J-FIL™) technology and utilizes the full capability of the 6025 format optical mask writing infrastructure to fabricate its masters and provide replication of 1XnmHP half pitch patterns onto a 6025 dimensioned substrate with high throughput and extremely low added distortion.
Perfecta MR5000 uses nanoimprint lithography to enable leading-edge patterning at the lowest cost of ownership in the semiconductor industry, with the added benefit of mask format compatibility for easy integration into the existing photomask ecosystem.
Resolution:2X nanometer half pitch
Image placement:2nm, 3σ uncorrectable distortion above master
Automation:Fully automated substrate handling
Throughput:4 mask replicas/hour
Field Size:26mm x 33mm
Download the Perfecta MR5000 Data Sheet.
To request more information on Perfecta MR5000, click here.
