Whole Wafer Nanoimprint Lithography System
The Imprio 1100 system represents the state of the art in fully automated single-sided, nanoimprint lithography, combining the resolution and CD control of electron beam lithography with the throughput, and operating simplicity of a mask aligner.
The Imprio 1100 can be configured to accept 50 mm to 100 mm substrates and is ideal for advanced development, pilot production, or full production depending on the options selected. Proven, turnkey lithography processes and qualified template replication capabilities combine to produce a cost effective imprint lithography solution with best in class cost of ownership.
The Imprio 1100 is ideally suited for applications in LEDs, laser diodes, optical components, and patterned substrate development.
The Imprio 1100 is able to print an entire wafer area in a single step, ensuring uniform periodicity and CD control wafer to wafer, while achieving throughput of 60 substrates per hour.
Resolution: Sub-50nm, half-pitch
Flexibility: Can be configured to accept 50 mm to 100 mm substrates
Automation: Automated wafer and template loading
To download the Imprio 1100 Data Sheet, click here.
To request more information on the Imprio 1100, click here.