 Imprio 450 is an industry-first low cost-of-ownership nanoimprint lithography solution for semiconductor 6025 mask replication that usesJet and Flash™ Imprint Lithography (J-FIL™)and easily integrates into existing semiconductor manufacturing infrastructures. Learn more… |
All of Molecular Imprints’ nanoimprint lithography systems are based on its core technology, Jet and Flash™ Imprint Lithography (J-FIL™). J-FIL enjoys many advantages over other lithography systems, among the most important: cost of ownership (CoO). Instead of costly laser sources and lens stacks, J-FIL uses conventional 365nm UV light source, I-line sensitive resists, and traditional optical photomasks to replicate making it well suited for HDD patterned media. For semiconductors, as J-FIL does not use sub-wavelength lithography, circuit designers are freed from restricted design rules (RDR), complex optical proximity correction (OPC), and costly phase shift masks.
Unlike thermal imprinting techniques, the J-FIL process is done at room temperature using low uniform capillary forces and UV light curing to provide superior alignment overlay management on thermal and pressure sensitive substrates.
Other UV-based imprint tools use spin-on resist, >99% is “spun-off”, creating a waste disposal issue, and consuming expensive clean room floor space. Molecular Imprints uses the IntelliJet™ Drop Pattern Generator System to dispense low viscosity imprint resist in pico-liter sized droplets immediately prior to the imprint step. This approach enables simultaneous imprinting of both dense and sparse features with very thin and uniform residual layer thickness (RTL) onto the substrate during the same imprint step.
Molecular Imprints offers the following nanoimprint lithography solutions.
 Perfecta TR1100 represents the first generation in fully automated nanoprint template replication, combining the resolution and CD control of e-beam with the throughput of a Jet and Flash™ Imprint Lithography (J-FIL™) system. Learn more… |
 Perfecta MR5000 is an industry-first low cost-of-ownership nanoimprint lithography solution for semiconductor 6025 mask replication that uses Jet and Flash™ Imprint Lithography (J-FIL™)and easily integrates into existing semiconductor manufacturing infrastructures. Learn more… |
 NuTera HD7000 represents the industry’s first nanopatterning system specifically designed for patterned media pilot- and volume-production applications. Learn more… |
 Imprio 1100 is the state of the art in fully automated single-sided nanoprint lithography, combining the resolution and CD control of electron beam lithography with the throughput, and operating simplicity of a mask aligner. Learn more… |
