Since its founding in 2001, Molecular Imprints’ steady growth and progress in developing Jet and Flash™ Imprint Lithography (J-FIL™) technology has been gaining traction in advanced semiconductor manufacturing. Keep up to date with the latest news by accessing our News and Information pages, where you can find recent stories and announcements about Molecular Imprints.
On May 9, 2013, President Barack Obama visited Applied Materials (Austin TX) who showcased a 450mm wafer patterned by Molecular Imprints:
An archive of events notable to the company over the years can also be found below.
|Defect Reduction for Semiconductor Memory Applications Using Jet and Flash Imprint Lithography Zhengmao Ye, Kang Luo, Xiaoming Lu, Brian Fletcher, Weijun Liu, Frank Xu, Dwayne LaBrake, Douglas Resnick, S.V. Sreenivasan, SPIE Advanced Lithography, February 2013|
|High Performance Wire Grid Polarizers using Roll Based Jet and Flash Imprint Lithography Sean Ahn, Jack Yang, Maha Ganapathisubramanian, Mike Miller, Jin Choi, Frank Xu, Douglas J. Resnick, S.V. Sreenivasan, SPIE Advanced Lithography, February 2013|
|NIL Template: progress and challenges Naoya Hayashi, Dai Nippon Printing Co., SPIE Advanced Lithography, February 2013|
Molecular Imprints' Core Technology
Jet and Flash™ Imprint Lithography (J-FIL™) uses low viscosity UV imprints fluids...
Molecular Imprints in the News
MII launches Semiconductor Industry into the 450mm era with the Imprio 450 lithography system