Since its founding in 2001, Molecular Imprints’ steady growth and progress in developing Jet and Flash™ Imprint Lithography (J-FIL™) technology has been well-recognized and documented by mainstream media. Keep up to date with the latest news by accessing our News and Information pages, where you can find recent stories and announcements about Molecular Imprints.
An archive of events notable to the company over the years can also be found below.
Intel showcases first J-FIL imprinted 450mm wafer at ISS
Robert E. Bruck, corporate vice president and general manager of Technology Manufacturing Engineering (TME), Intel Corporation, and Intel 450mm Equipment Program Manager Mario Abravanel displayed the first publicly shown fully patterned 450mm silicon wafer. The presentation was made at the SEMI Industry Strategy Symposium (ISS) on January 15, 2013. MII's new Imprio 450 tool was used to pattern the wafer with 26nm features using Jet and Flash™ Imprint Lithography (J-FIL™). Molecular Imprints' Jet and Flash™ Imprint Lithography technology will be used to fabricate thousands of wafers for suppliers engaged in 450mm tool development.
Molecular Imprints' Core Technology
Jet and Flash™ Imprint Lithography (J-FIL™) uses low viscosity UV imprints fluids...
Molecular Imprints in the News
MII launches Semiconductor Industry into the 450mm era with the Imprio 450 lithography system