World’s Market and Technology Leader for High-resolution, Low Cost-of-Ownership sub-30nm Nanoimprint Lithography Systems
Molecular Imprints, Inc. (MII) was founded in Austin, Texas in 2001, spun out of the University of Texas. Molecular Imprints has applied for over 700 patents, resulting in a growing portfolio of over 160 patents issued covering imprint tools, imprint materials and masks/templates, process technology and imprint-specific device designs. Jet and Flash™ Imprint Lithography (J-FIL™), powered by our IntelliJet™ Drop Pattern Generator Drop Pattern Generation System, is the heart of Molecular Imprints’ advanced nanoimprint technology, allowing precise placement of photoresist on substrates in picoliter quantities, enabling uniform and consistent nanoimprinting of features down to 10nm and below at very low cost. Molecular Imprints delivers this value to customers through integration of a unique set of core competencies and partnerships that cover lithography, precision nanomechanics, fluid dynamics, surface chemistry and materials formulation.
This unique nanoimprinting capability has been gaining acceptance towards high volume manufacturing in advanced semiconductor non-volatile memory (NVM). Current customer engagements include three of the top five semiconductor companies with equipment placed in Japan, Korea and USA.
J-FIL has demonstrated sub-26nm capability within the semiconductor industry and is extensible to the sub-20nm regime enabling the economical continuation of Moore’s Law. A drop-in replacement technology, Molecular Imprints’ systems are being evaluated for mix-and-match strategies with 193nm lithography where J-FIL’s resolution and cost advantages will be focused on critical layers, particularly in leading edge NVM devices.
Molecular Imprints' Core Technology
Jet and Flash™ Imprint Lithography (J-FIL™) uses low viscosity UV imprints fluids...
Molecular Imprints in the News
MII launches Semiconductor Industry into the 450mm era with the Imprio 450 lithography system