For conventional lithographic patterning, Molecular Imprints uses a family of photo-curable, low viscosity materials called MonoMat™ as its imprint resist. MonoMat is comprised of an organic monomer that polymerizes in seconds using low cost, broadband light sources. While other imprint tools use spin-on imprint resist, S-FIL^® systems dispense low viscosity imprint resist in very small droplets, one field at a time, immediately prior to the imprint step. Consequently, both the monomer dispense and imprint functions happen in a step and repeat fashion.

This Drop-On-Demand™ approach is a key distinguisher of S-FIL, enabling simultaneous imprinting of both dense and sparse features onto the substrate during the same imprint step. Because MonoMat droplets are dispensed in nanoliter volumes, a single 10-milliliter vial of imprint material, as shown in the photo, is projected to lithograph over four thousand 8-inch wafers.

Custom imprint formulations can also be developed for customers’ specific applications, including materials that can become functional device layers rather than sacrificial resists.