Molecular Imprints achieves fine alignment because the wafer and template (imprint mask) are less than 250 nanometers apart and in lubricated contact, which enables fine adjusting of the wafer and template. The S-FIL® imprint mask and substrate are in liquid contact due to the low viscosity imprint solution, which also behaves as a lubricant. MII is confident that it can demonstrate alignment capabilities that rival conventional state-of-the-art lithography systems.