Resolution:  Sub-50 nm
Alignment:  < 1 micron, 1 sigma (X, Y and Rotation)
Flexibility:   Handles up to 200mm wafers, including fragile substrates
Field size:   10mm x10mm active print area

The Imprio^® 55 is literally shaping the future of nano-lithography. This entry level tool is based on the unique Step and Flash^® imprint lithography process called S-FIL^® technology.

The Imprio 55 delivers high resolution, moderate alignment, and 3-dimensional replication to customers seeking an affordable, small size, sub-50 nanometer lithography tool. The Imprio 55 is the perfect "e-beam" amplifier. E-beam systems can now be used as pattern generators to create imprint templates, which in turn enable researchers to replicate critical experimental structures in minutes with S-FIL, rather than in days with e-beam lithography.