Resolution: Sub-32nm critical dimension (CD, half-pitch)
Overlay: < 50nm, mix-and-match
Flexibility: 200mm and 300mm substrates (SEMI standard)
Field size: 26mm x 32mm (step-and-scan compatible)
The Imprio® 250 system is the state-of-the-art in imprint lithography, offering Next Generation Lithography (NGL) capability today. This cost effective NGL systen is based on proven
S-FIL® processes with Drop-On-Demand™ technology.
The Imprio 250
offers sub-32nm half pitch resolution, sub-50nm overlay,
integrated magnification control, and fully automated wafer
and template loading capability. The
Imprio 250 is ideal for device and process prototyping and pre-production
for 32nm resolution, 22nm resolution, and beyond.
