Resolution: Sub-50
nm, half-pitch
Alignment: Optional <250nm
(single point X, Y) configuration available
Flexibility: Can be configured to accept 25mm to 150mm substrates
Automation: Automated wafer and template loading
The Imprio®
1100 system represents the next generation in fully automated nano-imprint lithography, combining the resolution and CD control of e-beam lithography with the throughput, overlay, and operating simplicity of a mask aligner.
The Imprio
1100 can be configured to accept 25mm to 150mm substrates and is ideal for advanced development, pilot production, or full production depending on the options selected. Proven, turnkey lithography processes and qualified template replication cabability combine to produce a cost effective imprint lithography solution with best in class cost of ownership.
The Imprio
1100 is ideally suited for applications in LEDs, laser diodes, optical components, and patterned media development.
2D Photonic Crystal Patterning for High Volume LED Manufacturing
Robert Hershey, Mike Miller, Chris Jones, M. GanapathiSubramanian, Xiaoming Lu, Gary Doyle, David Lentz, Dwayne LaBrake. SPIE Optics and Photonics manuscript, August 2006.
