Resolution: Sub-50nm
Alignment: < 500 nm, 3 sigma
(X, Y and Rotation)
Flexibility: Handles up to
200mm wafers, including fragile substrates
Field size: up to 25mm x 25mm active print area
The Imprio®
100 system is enabling nanotechnology. This middle-level tool
is based on the unique S-FIL® technology.
The Imprio
100 delivers high resolution, sub-micron alignment, and 3-dimensional
replication to customers seeking cost-effective sub-50nm lithography
tools. Designed to grow to full factory automation, the tool
contains a high performance wafer stage, an optional automatic
wafer loading capability, and a built-in clean-environment.
The Imprio
100 is ideally suited for use in small scale manufacturing facilities,
larger corporate R&D centers, and government laboratories
exploring nano-device fabrication, compound semiconductor development,
advanced photonics, microfluidics, and MEMs structures.
