Step and flash imprint lithography for storage-class memory
Mark W. Hart. Presented at EIPBN June 2007 and IEEE Lithography Workshop Dec. 2007, updated March 2008.
Study of nanoimprint lithography for applications toward 22-nm node CMOS devices
Ikuo Yoneda, Shinji Mikami, Takumi Ota, Takeshi Koshiba, Masamitsu Ito, Tetsuro Nakasugi, Tatsuhiko Hisashiki. SPIE Advanced Lithography presentation, February 2008.
Full-Field Imprinting of Sub-40nm Patterns
Sungho Hwang, Hoyeon Kim, Jeong-Ho Yeo, Ben Eynon. SPIE Advanced Lithography presentation, February 2008.
Etching of 42nm and 32nm Half-Pitch Features Patterned Using Step and Flash Imprint Lithography Cynthia B.Brooks, Dwayne LaBrake, Niyaz Khusnatdinov. SPIE Advanced Lithography presentation, February 2008.
Step and Flash Imprint Process Integration Techniques for Photonic Crystal Patterning: Template Replication through Wafer Patterning Irrespective of Tone (paper) Mike Miller, Cynthia B.Brooks, David Lentz, Gary Doyle, Doug Resnick, Dwayne LaBrake. SPIE Advanced Lithography paper, February 2008
Step and Flash Imprint Process Integration Techniques for Photonic Crystal Patterning: Template Replication through Wafer Patterning Irrespective of Tone (presentation) Mike Miller, Cynthia B.Brooks, David Lentz, Gary Doyle, Doug Resnick, Dwayne LaBrake. SPIE Advanced Lithography paper, February 2008
Dual Damascene BEOL Processing Using Multilevel Step and Flash Imprint Lithography
Brook Chao, Frank Palmieri, Wei-Lun Jen, D. Hale McMichael, C. Grant Willson, Jordan Owens, Rich Berger, Ken Sotoodeh, Bruce Wilksm Joseph Pham, Ronald Carpio, Ed LaBelle, Jeff Wetzel. SPIE Advanced Lithography presentation, February 2008.
Dual Damascene BEOL Processing Using Multilevel Step and Flash Imprint Lithography Brook Chao, Frank Palmieri, Wei-Lun Jen, D. Hale McMichael, C. Grant Willson, Jordan Owens, Rich Berger, Ken Sotoodeh, Bruce Wilksm Joseph Pham, Ronald Carpio, Ed LaBelle, Jeff Wetzel. SPIE Advanced Lithography paper, February 2008.
Status of the UV Nanoimprint Stepper Technology for Silicon IC Fabrication
S.V. Sreenivasan. SPIE Advanced Lithography presentation, February 2008.
Minimizing Linewidth Roughness for the 22nm Node Patterning with Step and Flash Imprint Lithography Gerard Schmid, Niyaz Khusnatdinov, Cynthia B. Brooks, Dwayne LaBrake, Ecron Thompson, Douglas J. Resnick. SPIE Advanced Lithography presentation, February 2008.
High Resolution Inspection of Step and Flash Imprint Lithography for the 32mn Node and Beyond Ian McMackin, Joseph Perez, Kosta Selinidis, John G. Maltabes, Wes Martin, Douglas J. Resnick, S.V. Sreenivasan. SPIE Advanced Lithography presentation, February 2008.
Linewidth Roughness: Here's the Solution
Douglas Resnick. Bacus Newsletter, February 2008.
Controlling Linewidth Roughness in Step and Flash Imprint Lithography
Gerard Schmid et al. EMLC, January 2008.
UV Nanoimprint Tool and Process Technology (presentation)
SV Sreenivasan. IEEE Lithography Worksop, December 2007.
Status and Future Lithography for Sub-hp32nm Device (presentation)
Tatsuhiko Higashiki. IEEE Lithography Worksop, December 2007.
Minimizing Linewidth Roughness in Step and Flash Imprint Lithography (presentation) Douglas Resnick et al. NNT, October 2007.
Nanoimprint applications toward 22nm node CMOS devices (presentation)
Ikuo Yodenda et al., Toshiba Corp. MNE, September 2007.
Minimizing Linewidth Roughness in Step and Flash Imprint Lithography (presentation) Douglas Resnick et al. MNE, September 2007.
Defect Reduction Progress in Step and Flash Imprint Lithography (presentation)
Selinidis et al. BACUS, September 2007.
The Development of Full Field High Resolution Imprint Templates (paper)
Shusuke Yoshitake et al. BACUS, September 2007.
The Development of Full Field High Resolution Iimprint Templates (presentation)
Shusuke Yoshitake et al. BACUS, September 2007.
Materials for Step and Flash Imprint Lithography (S-FIL ®)
Brian K. Long, B. Keith Keitz, C. Grant Willson. Journal of Materials Chemistry, September 2007.
Fabrication of dense sub-20nm pillar arrays on fused silica imprint templates
Gerard Schmid, Gary Doyle, Mike Miller, Doug Resnick. EIPBN Presentation, May 2007.
Patterned wafer defect density analysis of Step and Flash imprint lithography
Ian McMackin, Wesley Martin, John Perez, Kosta Selinidis, John Maltabes, Frank Xu, Doug Resnick, SV Sreenivasan. EIPBN Presentation, May 2007.
Step and flash imprint lithography fabrication for emerging market applications
Doug Resnick, Gerard Schmid, Mike Miller, Gary Doyle, Chris Jones, Dwayne LaBrake. Photomask Japan, April 2007.
Lithography Beyond 32 nm: A Role for Imprint? (paper)
Mark Melliar-Smith. SPIE Advanced Lithography Plenary Paper, February 2007.
Lithography Beyond 32 nm: A Role for Imprint? (presentation)
Mark Melliar-Smith. SPIE Advanced Lithography Plenary Presentation, February 2007.
Toward 22 nm for Unit Process Development Using Step and Flash Imprint Lithography (paper)
Gerard Schmid, Ecron Thompson, Nick Stacey, Doug Resnick, Deirdre Olynick, Erik Anderson. SPIE Advanced Lithography Paper, February 2007.
Toward 22 nm for Unit Process Development Using Step and Flash Imprint Lithography (presentation)
Gerard Schmid, Ecron Thompson, Nick Stacey, Doug Resnick, Deirdre Olynick, Erik Anderson. SPIE Advanced Lithography Presentation, February 2007.
Whole Wafer Imprint Patterning Using Step and Flash Imprint Lithography: A Manufacturing Solution for Sub 100 nm Patterning (paper)
David Lentz, Gary Doyle, Mike Miller, Gerard Schmid, Maha Ganapathisubramanian, Xiaoming Lu, Doug Resnick, Dwayne LaBrake. SPIE Advanced Lithography Paper, February 2007.
Whole Wafer Imprint Patterning Using Step and Flash Imprint Lithography: A Manufacturing Solution for Sub 100 nm Patterning (poster)
David Lentz, Gary Doyle, Mike Miller, Gerard Schmid, Maha Ganapathisubramanian, Xiaoming Lu, Doug Resnick, Dwayne LaBrake. SPIE Advanced Lithography Poster, February 2007.
A Study of Imprint-Specific Defects in the Step and Repeat Imprint Lithography Process
Joseph Perez, Kosta Selindis, Steven Johnson, Brian Fletcher, Frank Xu, Ian McMackin, Doug Resnick, S.V.Sreenivasan. SPIE Advanced Lithography Presentation, February 2007.
High Volume Full-Wafer Step and Flash Imprint Lithography
Doug Resnick, Gerard Schmid, Mike Miller, Gary Doyle, Chris Jones, Dwayne LaBrake. Solid State Technology, February 2007.
Multi-level Step and Flash Imprint Lithography for Direct Patterning of Dielectrics (paper) Wei-lun Jen, Frank Palmieri, Brook Chao, Michael Lin, Jianjun Hao, Jordan Owens, Ken Sotoodeh, Robin Cheung, C.Grant Willson.SPIE Advanced Lithography Paper, February 2007.
Multi-level Step and Flash Imprint Lithography for Direct Patterning of Dielectrics (presentation) Wei-lun Jen, Frank Palmieri, Brook Chao, Michael Lin, Jianjun Hao, Jordan Owens, Ken Sotoodeh, Robin Cheung, C.Grant Willson.SPIE Advanced Lithography Presentation, February 2007.
Direct Die-to-Database Electron Beam Inspection of Fused Silica Imprint Templates
Doug Resnick, L. Jeff Myron, Ecron Thompson, Toshiaki Hasebe, Toshifumi Tokumoto, C. Yan, M. Yamamoto, H. Wakamori, M. Inoue, Eric Ainley, Keven Nordquist, William Dauksher. Journal of Vacuum Sciene and Technology B, November 2006.
Implementation of an Imprint Damascene Process for Interconnect Fabrication
Gerard Schmid, Michael Stewart, Jeffrey Wetzel, Frank Palmieri, Jian Hao, Yukio Nishmura, Kane Jen, Eui Kyoon Kim, Doug Resnick, Alex Liddle, C. Grant Willson. Journal of Vacuum Sciene and Technology B, November 2006.
Imprinting Technique Offers Low-Cost Photonic Crystal LEDs
Robert Hershey. Compund Semiconductor, October 2006.
Step and Flash Imprint Lithography Templates for the 32nm Node and Beyond
Gerard Schmid, Ecron Thompson, Douglas Resnick, Deidre Olynick, Alexander Liddle, MNE, September 2006.
2D Photonic Crystal Patterning for High Volume LED Manufacturing
Robert Hershey, Mike Miller, Chris Jones, M. GanapathiSubramanian, Xiaoming Lu, Gary Doyle, David Lentz, Dwayne LaBrake. SPIE Optics and Photonics manuscript, August 2006.
Defect Inspection for Imprint Lithography Using a Die to Database Electron Beam Verification System
L. Jeff Myron, Ecron Thompson, Ian McMackin, Doug Resnick, Tadashi Kitamura, Toshiaki Hasebe, Shinichi Nakazawa, Toshifumi Tokumoto, Eric Ainley, Keven Nordquist, William Dauksher. SPIE Proceedings Vol 6151, 2006.
Imprint Lithography Advanced in LED Manufacturing
Robert Hershey, Gary Doyle, Chris Jones, Dwayne LaBrake, Mike Miller. ISBLLED 2006.
Advanced Prototyping Using Step and Flash Imprint
David Wang, Tom Rafferty, Phil Schumaker, Ian McMackin, David Vidusek, S.V. Sreenivasan. Solid State Technology, December 2005.
Effects of Etch Barrier Densification on Step and Flash Lithography
Steve Johnson, R. Burns, E.K. Kim, M.D. Dickey, Gerard Schmid, J. Meiring, S. Burns, C. Grant Willson, D. Convey, Y. Wei, P. Fejes, K. Gehoski, D. Mancini, K. Nordquist, W. Dauksher, Doug Resnick. Journal of Vacuum Science and Technology, November 2005.
An Enabling Technology for Nanoscale Manufacturing: S-FIL™
NSTI Nano Impact Summit, October 2005.
Fabrication of Nanometer Sized Features on Non-Flat Substrates Using a Nano-Imprint Lithography Process
Mike Miller, Gary Doyle, Nick Stacey, Frank Xu, S.V. Sreenivasan, Mike Watts, Dwayne LaBrake.
SPIE Microlithography Conference, February 2005.
S-FIL Technology: Cost of Ownership Case Study
Sunil Murty, Michael Falcon, S.V. Sreenivasan, Daren Dance.SPIE Microlithography Conference, February 2005.
Advanced Mask Metrology Enabling Characterization of Imprint Lithography Templates
L. Jeff Myron, Liraz Gershtein, Gidi Gottlieb, Bob Burkhardt, Andrew Griffiths, David Mellenthin, Kevin Rentzsch, Susan MacDonald, Greg Hughes.SPIE Microlithography Conference, February 2005.
Step and Flash Imprint Lithography
Doug Resnick, S.V. Sreenivasan, C. Grant Willson. Materials Today, February 2005.
Development of an Etch-definable Lift-Off Process for use with Step and Flash Imprint Lithography Ngoc V. Le, Kathleen Gehoski, William Dauksher, J. Baker, D.J. Resnick, Laura Dues. SPIE Microlithography Conference, February 2005
Repair of Step and Flash Imprint Lithography Templates
William Dauksher, Kevin Nordquist, N.V. Le, Kathleen Gehoski, David Mancini, D.J. Resnick, R. Bozak, R. White, J. Csuy, D. Lee. J. Vac. Sci. Technol. B, Nov/Dec 2004.
Fabrication of a surface acoustic wave-based correlator using step and flash imprint lithography G.F. Cardinale, J.L. Skinner, A.A. Talin, R.W. Brocato, D.W. Palmer, D. Mancini, W. Daukshur, K. Gehoski, N. Le, K. Nordquist, D. Resnick. J. Vac. Sci. Technol. B, Nov/Dec 2004.
Molecular Imprint: A Case Study on Success Through Strategic Industry and Academic Partnerships
Michael Falcon and Angela Ausman
Nanotechnology Law & Buisiness, vol 1.4 2004.
Distortion and Overlay Performance of UV Step and Repeat Imprint Lithography
Jin Choi, K. J. Nordquist, Ashuman Cherala, Lester Casoose, Kathleen Gehoski, William Dauksher, S.V. Sreenivasan, Doug Resnick. MNE Micro- and Nano- Engineering Conference, September 2004.
Image Placement Issues for ITO-based Step and Flash Imprint Lithography Templates Kevin Nordquist, Eric Ainley, David Mancini, William Dauksher, Kathleen Gehoski, J. Baker, D.J. Resnick, Z. Masnyj, P. Mangat. J. Vac. Sci. Technol. B, Mar/Apr 2004.
Development
of Imprint Materials for the Step and Flash Imprint Lithography
Process
Frank Xu, Nick Stacey, Mike Watts, Van Truskett, Ian McMackin,
Jin Choi, Philip Schumaker, Ecron Thompson, Daniel Babbs, S.V.
Sreenivasan, Grant Willson, Norm Schumaker.
SPIE Microlithography Conference, February 2004.
Evaluation of the Imprio 100 Step and Flash Imprint Lithography Tool
Doug Resnick, et al., February 2004.
Initial Study of the Fabrication of Step and Flash Imprint Lithography Templates for the Printing of Contact Holes
Doug Resnick, et al. SPIE Microlithography Conference, February 2004.
Evaluation of the Imprio 100 Step and Flash Imprint Lithography Tool
Doug Resnick, et al., February 2004.
Step and Flash Imprint Lithography for sub-80nm Contact Holes
D. Mancini, D. Resnick, S.V. Sreenivasan, M. Watts. Solid State Technology, February 2004.
Nanotechnology Small Print
S.V. Sreenivasan, Grant Willson, Doug Resnick. Small Print 2004.
Design
and Performance of a Step and Repeat Imprinting Machine
Ian McMackin, Philip Schumaker, Daniel Babbs, Jin Choi, Wenli
Collison, S.V. Sreenivasan, Norman Schumaker, Michael Watts,
Ronald Voisin. SPIE Microlithography Conference, February 2003.
Direct Imprinting of Dielectric Materials for Dual Damascene Processsing
Michael D. Stewart, Jeffrey Wetzel, Gerard Schmid, Frank Palmieri, Ecron Thompson, E.K. Kim, D. Wang, K. Sotoodeh, K. Jen, S.C. Johnson, J. Hao, M.D. Dickey, Y. Nishimura, R. Laine, D.J. Resnick, C.G. Willson. SPIE Microlithography Conference, February 2003.
Fabrication
of Step and Flash Imprint Lithography Templates Using Commercial
Mask Processes
Ecron
Thompson, Peter Rhyins, Ron Voisin, S.V. Sreenivasan, Patrick
Martin. SPIE Microlithography Conference, February 2003.
Advances in Step and Flash Imprint Lithography
S.C. Johnson, T.C. Bailey, M.D. Dickey, B.J. Smith, E.K. Kim, A.T. Jamieson, N.A. Stacey, J.G. Ekerdt, and C.G. Willson. SPIE Microlithography Conference, February 2003.
Employing Step and Flash Imprint Lithography for Gate Level Patterning of a MOSFET Device
B.J. Smith, N.A. Stacey, J.P. Donnelly, D.M. Onsongo, T.C. Bailey, C.J. Mackay, D.J. Resnick, W.J. Dauksher, D. Mancini, K.J. Nordquist, S.V. Sreenivasan, S.K. Banerjee, J.G. Ekerdt, C.G. Willson. SPIE Microlithography Conference, February 2003.
Step
and Flash Imprint Lithography Template Characterization, from
an Etch Perspective
Doug Resnick, et al. EIPBN Conference, June 2003.
Imprint
Lithography: Lab Curiosity or the Real NGL?
D. J. Resnick, W. J. Dauksher, D. Mancini, K. J. Nordquist,
T. C. Bailey, S. Johnson, N. Stacey, J. G. Ekerdt, C. G. Willson,
S V Sreenivasan, and N. Schumaker.
SPIE Microlithography Conference, February 2003.
Analysis
of Critical Dimension Uniformity for step and flash imprint
lithography
David P. Mancini, Kathleen A. Gehoski, William J. Dauksher,
Kevin J. Nordquist, Douglas J. Resnick, Philip Schumaker, and
Ian McMackin. SPIE Microlithography Conference, February 2003.
Hydrogen
Silsesquioxane for Direct Electron-Beam Patterning of Step and
Flash Imprint Lithography Templates
D. P. Mancini, K. A. Gehoski, E. Ainley, K. J. Nordquist, D.
J. Resnick,T. C. Bailey, S.V. Sreenivasan, J. G. Ekerdt, and
C. G. Willson.
J. Vac. Sci. Technol. B, Nov/Dec 2002.
Characterization
of and Imprint Results Using Indium Tin Oxide-Based Step and
Flash Imprint Lithography Templates
W. J. Dauksher, K. J. Nordquist, D. P. Mancini, D. J. Resnick,
J. H. Baker, A. E. Hooper, A. A. Talin, T. C. Bailey, A. M.
Lemonds, S.V. Sreenivasan, J. G. Ekerdt, and C. G. Willson.
J. Vac. Sci. Technol. B, Nov/Dec 2002.
High
Resolution Templates for Step and Flash Imprint Lithography
D. J. Resnick, W. J. Dauksher, D. Mancini, K. J. Nordquist,
E. Ainley, K. Gehoski, J. H. Baker, T. C. Bailey, B. J. Choi,
S. Johnson, S.V. Sreenivasan, J. G. Ekerdt, and C. G. Willson.
J. Microlith., Microfab., Microsyst., Vol. 1 No. 3, October
2002.
Cost of Ownership Analysis for Patterning Using Step and Flash Imprint Lithography
S.V. Sreenivasan, C.G. Willson, N.E. Schumaker, D.J. Resnick. NIST-SPIE Conference on Nanotechnology, September 2002.
Critical
Dimension and Image Placement Issues for Step and Flash Imprint
Lithography Templates
Kevin J. Nordquist, David P. Mancini, William J. Dauksher, Eric
S. Ainley, Kathy A. Gehoski, Douglas J. Resnick, Zorian S. Masnyj
and Pawitter J. Mangat.
22nd Annual BACUS Symposium on Photomask Technology, September
2002.
Release
Layers for Contact and Imprint Lithography
Douglas Resnick, David P. Mancini, S.V. Sreenivasan, C.
Grant Willson. Semiconductor International, June 2002.
Template
Fabrication Schemes for Step and Flash Imprint Lithography
T.C. Bailey, D.J. Resnick, D. Mancini, K.J. Nordquist, W.
Dauksher, E. Ainley, A. Talin, K. Gehoski, J.H. Baker, B.J.
Choi, S. Johnson, M. Colburn, M. Meissl, S.V. Sreenivasan, J.G.
Ekerdt, C.G. Willson.
Microelectronic Engineering, 61– 62, 2002.
High
Resolution Templates for Step and Flash Imprint Lithography
D. J. Resnick, W. J. Dauksher, D. Mancini, K. J. Nordquist,
E. Ainley, K. Gehoski, J. H. Baker, T. C. Bailey, B. J. Choi,
S. Johnson, S.V. Sreenivasan, J. G. Ekerdt, and C. G. Willson.
SPIE Microlithography Conference, February 2002.
Prediction
of fabrication distortions in step and flash imprint lithography
templates
C. J. Martin, R. L. Engelstad, E. G. Lovell, D. J. Resnick,
E. J. Weisbrod.
J. Vac. Sci. Technol. B, Nov/Dec 2002.
Step and Flash Imprint Lithography: Defect Analysis
T. Bailey, B. Smith, B.J. Choi, M. Colburn, M. Meissl, S.V. Sreenivasan, J.G. Ekerdt, C.G. Willson. J. Vac. Sci. Technology B, Nov/Dec 2001.
Characterization and Modeling of Volumetric and Mechanical Properties for Step and Flash Imprint Lithography Photopolymers M. Colburn, I. Suez, B.J. Choi, M. Meissl, T. Bailey, S.V. Sreenivasan, J. G. Ekerdt, C. G. Willson. J. Vac. Sci. Technology B, Nov/Dec 2001.
New Methods for Fabricating Step and Flash Imprint Lithography Templates
D. J. Resnick, T. C. Bailey, D. Mancini, K. J. Nordquist, W. J. Dauksher, E. Ainley, A. Talin, K. Gehoski, J. H. Baker, B. J. Choi, S. Johnson, M. Colburn, M. Meissl, S.V. Sreenivasan, J. G. Ekerdt, and C. G. Willson. NIST-SPIE Conference on Nanotechnology, September 2001.
Design of Orientation Stages for Step and Flash Imprint Lithography
B. J. Choi, S. Johnson, M. Colburn, S.V. Sreenivasan, C.G. Willson. Journal of Int. Societies for Precision Engineering and Nanotechnology, July, 2001.
Development and Advantages of Step-and-Flash Lithography
M. Colburn, T. Bailey, B. J. Choi, J.E. Ekerdt, S.V. Sreenivasan, C.G. Willson.
Solid State Technology, July 2001.
Layer to Layer Alignment for Step and Flash Imprint Lithography
B.J. Choi, M. Meissl, Y.J. Choi, M. Kerwick, M. Colburn, T. Bailey, S.V. Sreenivasan, J.G. Ekerdt, C.G. Willson. SPIE's 26th Intl. Symp. Microlithography: Emerging Lithographic Technologies, March 2001.
Step and Flash Imprint Lithography: Template Surface Treatment and Defect Analysis T. Bailey, B. J. Choi, M. Colburn, A. Grot, M. Meissl, S. Shaya, J.G. Ekerdt, S.V. Sreenivasan, C.G. Willson. American Vacuum Society J. of Vac. Sci. & Technol. B, Vol. 18, No. 6, Nov/Dec 2000.
Partially Constrained Compliant Stages for High Resolution Imprint Lithography
B. J. Choi, S. Johnson, S.V. Sreenivasan, M. Colburn, T. Bailey, C.G. Willson.
Proceedings of ASME 2000 Design Engineering Technical Conference, September 2000.
Step and Flash Imprint Lithography for sub-100nm Patterning
M. Colburn, A. Grot, M. Amistoso, B. J. Choi, T. Bailey, J. Ekerdt, S.V. Sreenivasan, J. Hollenhorst, C. G. Willson. SPIE's 25th Intl. Symp. Microlithography: Emerging Lithographic Technologies III. March 3, 2000.
Patterning Curved Surfaces: Template Generation by Ion Beam Proximity Lithography and Relief Transfer by Step and Flash Imprint Lithography P. Ruchhoeft, M. Colburn, B. Choi, H. Nounu, S. Johnson, T. Bailey, M. Stewart, J. Ekerdt, S.V. Sreenivasan, J.C. Wolfe, C.G. Willson. American Vacuum Society J. of Vac. Sci. Technol. B 17(6), pp. 2965-2969, Nov./Dec. 1999.
Step and Flash Imprint Lithography: A New Approach to High-Resolution Patterning
M. Colburn, S. Johnson, M. Stewart, S. Damle, T. Bailey, B.J. Choi, M. Wedlake, T. Michaelson, S.V. Sreenivasan, J. Ekerdt, C.G. Willson. Proceedings of SPIE's 24th International Symposium on Microlithography: Emerging Lithographic Technologies III, Vol. 3676, March 1999.
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