S-FIL^®: An Enabling Technology

Unlike next generation optical lithography, the Imprio^® family of tools uses a conventional 365nm UV lamp to replicate sub-50nm features and does not require expensive DUV laser sources and projection optics. The S-FIL^® process exactly replicates the imprint templates, thereby making complex OPC masks unnecessary. S-FIL technology is a formidable substitute for next generation lithography, at a fraction of the price.

Click on the tabs on the left to learn about the capabilities of the S-FIL process.