Technology and Markets:
J-FIL™ technology is found on all Molecular Imprints systems and leverages the synergy of our materials and masks / templates to maximize system productivity and yield. Our lithography systems are in three classes, targeting specific markets and applications:
Step and Repeat J-FIL™
- CMOS Memory
- 1x nm patterning without double patterning steps
- Flat panel display patterning
Full substrate J-FIL™
- Patterned Sapphire Substrates for HB-LEDs
Molecular Imprints' Core Technology
Jet and Flash™ Imprint Lithography (J-FIL™), unlike common imprint technologies that rely on heat embossing to melt thermoplastic solids, transfers nanopatterns into a proprietary water-like photopolymer which conforms almost instantaneously to a mask (a.k.a., template) due to capillary forces. J-FIL uses proprietary inkjet technology and Molecular Imprints IntelliJet™ Drop Pattern Generator system to deposit picoliter sized drops according to the customers mask/template pattern. This insures a consistent and uniform pattern etch even below 20nm.
Molecular Imprints in the News
January 16, 2013 Molecular Imprints Delivers Industry's 1st 450MM Advanced Lithography System to a Leading Semiconductor Manufacturer
September 24, 2012 Molecular Imprints receives multiple unit purchase order to provide advanced lithography equipment for high volume semiconductor manufacturing.