Molecular Imprints' Core Technology
Jet and Flash™ Imprint Lithography (J-FIL™) is conceptually based on the ancient art of embossing, updated for the nano-world. Unlike typical imprint technologies that rely on heat to melt thermoplastic solids, J-FIL imprints into a proprietary water-like photopolymer which conforms virtually instantaneously to an imprint mask (template) due to capillary forces. J-FIL uses proprietary inkjet technology and Molecular Imprints IntelliJet™ Drop Pattern Generator system to deposit picoliter sized drops according to the customers mask/template pattern. This insures a consistent and uniform pattern etch even below 20nm.
Molecular Imprints in the News
Jan. 11, 2011 Molecular Imprints Ships Semiconductor Industry-First Nanoimprint Mask Replication System to Dai Nippon Printing Co., LTD.
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June 3, 2010 Korean Ambassador
Han Duk-soo
visits Molecular Imprints' Austin, TX. Headquarters.
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